ATOMIC LAYER DEPOSITION EQUIPMENT AND ATOMIC LAYER DEPOSITION METHOD USING THEREOF

摘要

PURPOSE: An atomic layer deposition apparatus and an atomic layer deposition method using the same are provided to reduce the process cost of the atomic layer deposition by reducing the number of precursor used for the deposition of the atomic layer. CONSTITUTION: A precursor discharging unit(102) and a precursor supplying unit(104) are connected serially. The precursor discharging unit and the precursor supplying unit are connected in parallel. A plurality of reactors is equipped with the precursor supplying unit and the precursor discharging unit. The amount of precursors supplied to the reactor is maintained same in the plurality of reactors.