| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for measuring and controlling a target trajectory, which can maintain stable supply of EUV light by adjusting a position or angle of a target injection nozzle even if an injection direction of a droplet target injected from the target injection nozzle is inclined from a predetermined injection direction in a chamber apparatus of an LPP light source.SOLUTION: The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of the position and angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position. |
