发明名称 CLEANING METHOD OF MEMBER, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND CLEANING LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method of a member which is used for immersion exposure and is in contact with liquid, and to provide a cleaning liquid which is used for cleaning the member.SOLUTION: The cleaning method includes steps for: cleaning the member which is in contact with an immersion liquid with an alkaline solution, and then cleaning the member with a solution containing a buffered hydrofluoric acid and a hydrogen peroxide.
申请公布号 JP2011003759(A) 申请公布日期 2011.01.06
申请号 JP20090146034 申请日期 2009.06.19
申请人 NIKON CORP 发明人 WATANABE SHUNJI;ICHIKAWA TADASHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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