发明名称 |
CLEANING METHOD OF MEMBER, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND CLEANING LIQUID |
摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method of a member which is used for immersion exposure and is in contact with liquid, and to provide a cleaning liquid which is used for cleaning the member.SOLUTION: The cleaning method includes steps for: cleaning the member which is in contact with an immersion liquid with an alkaline solution, and then cleaning the member with a solution containing a buffered hydrofluoric acid and a hydrogen peroxide. |
申请公布号 |
JP2011003759(A) |
申请公布日期 |
2011.01.06 |
申请号 |
JP20090146034 |
申请日期 |
2009.06.19 |
申请人 |
NIKON CORP |
发明人 |
WATANABE SHUNJI;ICHIKAWA TADASHI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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