发明名称 SEMICONDUCTOR COMPRISING RECESS GATE AND METHOD OF FORMING THE SAME
摘要 <p>PURPOSE: A semiconductor device including a recess gate and a method for forming the same are provided to improve the operational yield of a recess gate by preventing the generation of a bridge phenomenon between recess gates. CONSTITUTION: An element isolation film(20) defines an active area in a semiconductor substrate(10). The element isolation film includes an oxide film. A dummy active region(12) is formed at one end of the cell region in the semiconductor substrate. A gate structure(30) is formed in the semiconductor substrate. The end part(35) of the gate structure is formed in the dummy active region.</p>
申请公布号 KR20110001806(A) 申请公布日期 2011.01.06
申请号 KR20090059511 申请日期 2009.06.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, SEUNG JIN
分类号 H01L21/336;H01L21/027 主分类号 H01L21/336
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