发明名称 DIVIDED ANNULAR RIB-SHAPED PLASMA PROCESSING DEVICE
摘要 <p>A plasma flow-derived sediment deposited on an annular rib for droplet capture in a plasma processing device is prevented from falling in a plasma generation unit and causing a short circuit. The annular rib for the droplet capture is divided into a plurality of rib pieces. Thus, from the beginning of the deposition of the sediment on the annular rib due to the aggregation of plasma-flow substances, it is possible to mince the sediment. By mincing the sediment, when a piece of the sediment falls in the plasma generation unit, the piece of the sediment gets into a groove portion provided between a cathode and a wall surface of the plasma generation unit, thereby preventing the electrical short circuit between the cathode and the wall surface.</p>
申请公布号 WO2011002036(A1) 申请公布日期 2011.01.06
申请号 WO2010JP61193 申请日期 2010.06.30
申请人 FERROTEC CORPORATION;SHIINA, YUICHI;WATANABE, IWAO 发明人 SHIINA, YUICHI;WATANABE, IWAO
分类号 C23C14/32;C23C14/24;H05H1/48 主分类号 C23C14/32
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