| 摘要 |
<p>Disclosed is an abnormality detection system that accurately detects abnormalities that arise in a device. The abnormality detection system (100), which detects abnormalities that arise in a plasma processing device (2), is provided with: a plurality of ultrasound sensors (41), which detect acoustic emissions (AE), which cause abnormalities to arise; a distributor (65), which distributes each output signal from the ultrasound sensors (41) into a first signal and a second signal; a trigger (52), which samples the first signal at, for example, 10 kHz, and generates a trigger signal when predetermined characteristics are detected; a trigger generation time counter (54), which receives trigger signals and determines the time of trigger generation; a data logger board (55), which creates sampling data from sampling the second signal at, for example, 1 MHz; and a PC (50), which analyzes abnormalities arising in the plasma processing device (2) by means of performing waveform analysis of data from the sampling data, said data corresponding to a set time period using the time of trigger generation determined by the trigger generation time counter (54) as a benchmark.</p> |
