发明名称 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PURPOSE: A positive type photosensitive resin composition for an interlayer insulating film is provided to ensure high transparency and excellent insulation property when baked at a high temperature. CONSTITUTION: A positive type photosensitive resin composition for an interlayer insulating film comprises: (A) an alkali soluble resin including an acrylic repeating unit; (B) a 1,2-quinonediazide compound; and (C) a compound with at least two partial structures represented by chemical formula (I), which has 600-2000 of molecular weight. In chemical formula (I), R^1 and R^2 are independently show a methyl group or tert-butyl group, wherein at least one of R^1 and R^2 is a tert-butyl group; and R^3 is -O- or -NH-.
申请公布号 KR20110001879(A) 申请公布日期 2011.01.06
申请号 KR20100049795 申请日期 2010.05.27
申请人 FUJIFILM CORPORATION 发明人 SUGIHARA KOICHI;YAMADA SATORU
分类号 G03F7/039;G02F1/13;G03F7/022 主分类号 G03F7/039
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