发明名称 |
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
PURPOSE: A positive type photosensitive resin composition for an interlayer insulating film is provided to ensure high transparency and excellent insulation property when baked at a high temperature. CONSTITUTION: A positive type photosensitive resin composition for an interlayer insulating film comprises: (A) an alkali soluble resin including an acrylic repeating unit; (B) a 1,2-quinonediazide compound; and (C) a compound with at least two partial structures represented by chemical formula (I), which has 600-2000 of molecular weight. In chemical formula (I), R^1 and R^2 are independently show a methyl group or tert-butyl group, wherein at least one of R^1 and R^2 is a tert-butyl group; and R^3 is -O- or -NH-. |
申请公布号 |
KR20110001879(A) |
申请公布日期 |
2011.01.06 |
申请号 |
KR20100049795 |
申请日期 |
2010.05.27 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
SUGIHARA KOICHI;YAMADA SATORU |
分类号 |
G03F7/039;G02F1/13;G03F7/022 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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