发明名称 REACTION FORCE PROCESSING MECHANISM, STAGE DEVICE EQUIPPED WITH REACTION FORCE PROCESSING MECHANISM, AND SEMICONDUCTOR INSPECTION DEVICE EQUIPPED WITH STAGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a reaction force processing mechanism that enhances reliability, and to provide a stage device equipped with the reaction force processing mechanism, and a semiconductor inspection device equipped with the stage device.SOLUTION: The reaction force processing mechanism 20 is provided in the stage device 1 equipped with a surface plate 3 which is supported on a rack 2 through a vibration isolation unit 8, a stage 7 for moving the surface plate 3 in the X-axis direction, and a shaft motor 6 having a magnet shaft 4 connected with the surface plate 3 and driving the stage, in order to process a reaction force that is applied to the surface plate 3 as the stage 7 moves. The reaction force processing mechanism includes a coil unit 22 for processing the reaction force that is disposed around the magnet shaft 4 of the shaft motor 6 for driving the stage and cooperating with the magnet shaft 4 to apply a force to the surface plate 3, and a transmission mechanism 24 connected with the coil unit 22 for processing the reaction force and transmitting the reaction force of the force applied to the surface plate 3 by the coil unit 22 for processing the reaction force to the rack 2.
申请公布号 JP2011003587(A) 申请公布日期 2011.01.06
申请号 JP20090143308 申请日期 2009.06.16
申请人 SUMITOMO HEAVY IND LTD 发明人 NISHIMAKI JUN;NAKAMORI YASUHITO;MAKINO FUMINORI
分类号 H01L21/68;B65G49/07;H01L21/66 主分类号 H01L21/68
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