| 摘要 |
A cup wash disk jig employed to clean photoresist from a spin-on chamber, receives cleaning solvent from both the bottom and the top, enhancing cleaning effectiveness. The cup wash disk includes a first set of channels allowing fluid communication between a hole positioned in a top surface of the cup wash disk jig, and a plurality of orifices distributed about the edge of the jig. Solvent is applied to the top surface of the jig, for example from an existing reduce resist control (RRC) nozzle normally utilized to dispense resist material. The solvent is flowed through these channels and ejected from the disk sides through the orifice, thereby facilitating removal of resist residue from coater cup portions of the chamber. Solvent may also be applied to an opening in a bottom surface of the jig, for example from a back rinse nozzle, to flow through a second set of channels and be ejected through different jig edge orifices.
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