发明名称 |
OVERLAY VERNIER AND METHOD FOR FORMING THE SAME |
摘要 |
<p>PURPOSE: An overlay vernier and a forming method thereof are provided to efficiently read an overlay by preventing an overlay reading error by preventing the width of the vernier from widening after a slim/etch process which is repeated several times by forming an overlay vernier with a mesa structure. CONSTITUTION: A polygonal main vernier has a plurality of laminated sub layers to form a step shape on both sides. A polygonal sub vernier is formed in the inner side of the main vernier. The main vernier has a polygonal frame type. A first oxide/poly layer(420) has the same width as a photosensitive pattern(410).</p> |
申请公布号 |
KR20110001690(A) |
申请公布日期 |
2011.01.06 |
申请号 |
KR20090059350 |
申请日期 |
2009.06.30 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
KOO, SUN YOUNG;LIM, CHANG MOON |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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