| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask conveyance apparatus, an exposure apparatus, a mask conveyance method and a method of manufacturing a device, that can suppress breakage of a pellicle provided to a mask while maintaining the throughput as the whole of the apparatuses.SOLUTION: A reticle conveyance apparatus 12 which conveys a reticle having a pattern surface where a prescribed pattern is formed into a load lock chamber 21 whose pressure is adjustable includes a vacuum pump 24 which reduces the pressure in the load lock chamber 21, and a control unit 41 which discriminates whether the pellicle protecting the pattern surface is provided to the reticle, and controls the vacuum pump 24 to reduce the pressure in the load lock chamber 21 at a first speed when it is discriminated that the reticle is not provided with the pellicle and to reduce the pressure in the load lock chamber 21 at a second speed slower than the first speed when it is discriminated that the reticle is provided with the pellicle. |
