发明名称 POSITIVE RADIATION-SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM, AND FORMING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a polysiloxane based positive radiation sensitive composition which can form an interlayer insulation film having superior radiation sensitivity melt flow-proofness, high heat resistance, transparency or the like.SOLUTION: The positive radiation sensitive composition includes [A] siloxane polymer being a hydrolyzable silane compound and/or its hydrolysis condensate, [B] a bissilane compound of structure coupled with a 1C-6C alkylene group, a phenylene group and 1, 4-dialkyl phenylene group, and [C] a quinonediazide compound.
申请公布号 JP2011002517(A) 申请公布日期 2011.01.06
申请号 JP20090143673 申请日期 2009.06.16
申请人 JSR CORP 发明人 HANAMURA MASAAKI;UEDA JIRO;FUJIOKA MASAYASU
分类号 G03F7/075;G03F7/004;G03F7/023;G03F7/40 主分类号 G03F7/075
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