发明名称 |
METHODS OF USING A SILICON NANOPARTICLE FLUID TO CONTROL IN SITU A SET OF DOPANT DIFFUSION PROFILES |
摘要 |
<p>A method of forming a multi-doped junction on a substrate is disclosed. The method provides doping the front of the substrate with boron atoms, and depositing an ink in a pattern, the ink comprising a set of nanoparticles and a set of solvents, and heating the substrate in a baking ambient to a first temperature of between about 200°C and about 800°C and for a first time period of between about 3 minutes and about 20 minutes in order to create a densified film ink pattern, exposing the substrate to a dopant source in a diffusion furnace with a deposition ambient, the deposition ambient comprising POCh, a earner N2 gas, a main N2 gas, and a reactive O2 gas, wherein a ratio of N2 gas to O2 gas is between about 1:1 to about 1.5:1, at a second temperature and for a second time period.</p> |
申请公布号 |
WO2011002898(A1) |
申请公布日期 |
2011.01.06 |
申请号 |
WO2010US40623 |
申请日期 |
2010.06.30 |
申请人 |
INNOVALIGHT, INC.;SCARDERA, GIUSEPPE;POPLAVSKYY, DMITRY;BURROWS, MICHAEL;SHAH, SUNIL |
发明人 |
SCARDERA, GIUSEPPE;POPLAVSKYY, DMITRY;BURROWS, MICHAEL;SHAH, SUNIL |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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