| 摘要 |
<p>PURPOSE: An overlay vernier and a method for measuring an overlay using the same are provided to improve arrangement between layers by applying a vernier pattern with a plurality of polygonal vernier marks to a plurality of layers. CONSTITUTION: A reference vernier pattern(210) includes a polygonal center vernier mark. A plurality of vernier patterns includes a plurality of polygonal vernier marks. The reference vernier pattern and the plurality of vernier patterns are positioned in an overlay vernier arrangement region.</p> |
