发明名称 ELECTRODE PLATE FOR PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electrode plate capable of executing plasma treatment having in-plane uniformity by improving a heat transfer characteristic between electrodes in a superimposed state.SOLUTION: The electrode plate 3 has a plurality of electrode constituting plates 21, 22 laminated and fixed and a plurality of gas passage holes 11 formed by making through holes 23, 24 of the electrode constituting plates 21, 22 communicate with each other. In the electrode plate 3, recesses 26 and convex portions 28 engaged with each other are disposed between the laminated surfaces 25, 27 of the electrode constituting plates 21, 22 so as to distribute in the plane direction of the electrode constituting plates 21, 22 while avoiding the gas passage holes 11, and a conductive adhesive 29 for fixing the electrode constituting plates 21, 22 is intervened between a bottom surface 26a of each of the recesses 26 and a front end surface 28a of each of the convex portions 28.
申请公布号 JP2011003731(A) 申请公布日期 2011.01.06
申请号 JP20090145563 申请日期 2009.06.18
申请人 MITSUBISHI MATERIALS CORP 发明人 FUJITA SATOSHI;YONEHISA TAKASHI
分类号 H01L21/3065 主分类号 H01L21/3065
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