LITHOGRAPHY SIMULATION METHOD, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To easily execute accurate lithography simulation considering a best focus difference.SOLUTION: The lithography simulation method includes steps of: applying defocus processing to an image formation condition of lithography simulation by referring to a table with a relationship between the dimension of a mask pattern of a simulation object and a defocus amount specified therein; and calculating the dimension of a transfer pattern corresponding to the mask pattern using the image formation condition with the defocus processing applied thereto.