METHOD OF ULTRAVIOLET EXPOSURE, ULTRAVIOLET EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING ELECTROFORMING MOLD PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method of ultraviolet exposure capable of imparting an inclined plane to the sidewall of a resist pattern at an optional angle to a micronano pattern which is difficult to form an inclination on the sidewall, and to provide an ultraviolet exposure device.SOLUTION: A method of ultraviolet exposure includes: a step of exposing an ultraviolet photosensitive material to a pattern of a photomask by changing the relative position of the focal point of the ultraviolet ray and the ultraviolet photosensitive material that is formed on the substrate; and a step of developing the ultraviolet photosensitive material. In the method of ultraviolet exposure and the ultraviolet exposure device, the pattern of the ultraviolet photosensitive material having the inclined plane according to the relative position is formed at the sidewall.