发明名称 LASER EXPOSURE METHOD, PHOTORESIST LAYER WORKING METHOD, AND PATTERN MOLDING MANUFACTURING METHOD
摘要 <p>A laser exposure method for performing exposure is provided in which a supporting stage (2) supporting a plurality of objects (workpieces 5) and a laser beam illumination device (3) illuminating the objects while a focus servo control based on reflected light is being effected are moved relative to each other. The method includes a control start step of starting the focus servo control when the laser beam has reached a focus start position (FS) on an object; a control stop step of stopping the focus servo control when the laser beam has reached a focus stop position (FE) on the object; and a retaining step of retaining a position of an optical component (objective lens 35) at a predetermined position for a period until the laser beam starting from the focus stop position (FE) on the object reaches a focus start position (FS) on a subsequent object.</p>
申请公布号 EP2270598(A1) 申请公布日期 2011.01.05
申请号 EP20090734419 申请日期 2009.03.23
申请人 FUJIFILM CORPORATION 发明人 USAMI, YOSHIHISA
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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