发明名称 Method for producing electrical interlayer connection in substrate of micro-component or sensor, involves opening mask layer over substrate area provided for electrical interlayer connection, where mask layer is applied on substrate
摘要 <p>The method involves opening a mask layer over a substrate area provided for the electrical interlayer connection. The mask layer is applied on the substrate (10). A through-hole is generated in the substrate area and an electrical interlayer connection is inserted in the through-hole. The mask layer partially remains in the area of the through-hole during opening of the mask layer, generation of the through-hole and insertion of the electrical interlayer connection. An independent claim is also included for a substrate with an opening recess.</p>
申请公布号 DE102009027321(A1) 申请公布日期 2011.01.05
申请号 DE20091027321 申请日期 2009.06.30
申请人 ROBERT BOSCH GMBH 发明人 REINMUTH, JOCHEN;WILL, BARBARA;WEBER, HERIBERT
分类号 H01L21/283;B81B7/02;H01L21/768;H01L23/482;H01L23/50 主分类号 H01L21/283
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