发明名称 Method for forming micro lenses and semiconductor device including the micro lenses
摘要 In a method for forming micro lenses, a lens material layer made of an inorganic material is formed on a substrate, and an intermediate layer made of an organic material is formed on the lens material layer. Then, a mask layer made of an organic material is formed on the intermediate layer, and lens shapes are formed in the mask layer. The lens shapes of the mask layer are transcribed to the intermediate layer by etching the mask layer and the intermediate layer. Thereafter, the lens shapes of the intermediate layer are transcribed to the lens material layer to form micro lenses by etching the intermediate layer and the lens material layer using a processing gas containing SF6 gas and CHF3 gas.
申请公布号 US7862732(B2) 申请公布日期 2011.01.04
申请号 US20070761880 申请日期 2007.06.12
申请人 TOKYO ELECTRON LIMITED 发明人 AMEMIYA HIROKI
分类号 B81C1/00 主分类号 B81C1/00
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