发明名称 |
Method of producing a strained layer |
摘要 |
A method of producing a strained layer on a substrate includes assembling a layer with a first structure or first means of straining including at least one substrate or one layer capable of being deformed within a plane thereof under the influence of an electric or magnetic field or a photon flux. The layer is strained by modifying the electric or magnetic field or the photon flux. The strained layer is assembled with a transfer substrate and all or part of the first straining structure is removed.
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申请公布号 |
US7863156(B2) |
申请公布日期 |
2011.01.04 |
申请号 |
US20090410161 |
申请日期 |
2009.03.24 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
DEGUET CHRYSTEL;FOURNEL FRANK |
分类号 |
H01L21/30;H01L21/46 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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