发明名称 Method and resulting structure using silver for LCOS devices
摘要 A method for fabricating an LCOS device. The method includes providing a semiconductor substrate and forming a plurality of MOS transistor devices formed on a portion of the semiconductor substrate. The method includes forming a first dielectric layer overlying the plurality of transistor devices and forming a first metal layer overlying the first dielectric layer. The method includes forming a second dielectric layer overlying the first metal layer and forming a plurality of pixel regions made substantially of silver bearing material overlying the second dielectric layer. In a preferred embodiment, the silver bearing material has much higher reflectivity for wavelengths of 450 nanometers and greater.
申请公布号 US7863145(B2) 申请公布日期 2011.01.04
申请号 US20080234382 申请日期 2008.09.19
申请人 SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION 发明人 XIANG YANGHUI OLIVER;LU ENLIAN
分类号 H01L21/8238;H01L21/331;H01L21/336;H01L21/76 主分类号 H01L21/8238
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