发明名称 Fin field effect transistor and method for forming the same
摘要 Example embodiments are directed to a method of forming a field effect transistor (FET) and a field effect transistor (FET) including a source/drain pair that is elevated with respect to the corresponding gate structure.
申请公布号 US7863683(B2) 申请公布日期 2011.01.04
申请号 US20070714160 申请日期 2007.03.06
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM KEUNNAM;YOSHIDA MAKOTO
分类号 H01L27/01;H01L27/12;H01L31/0392 主分类号 H01L27/01
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