发明名称 Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser array
摘要 Provided is a surface emitting laser manufacturing method, etc., which reduces process damage occurring to a surface relief structure, enabling stable provision of a single transverse mode characteristic. Provided is a method including a surface relief structure for controlling a reflectance in a light emitting portion of an upper mirror, the surface relief structure including a stepped structure, includes: forming a resist pattern including a pattern for forming a mesa structure and a pattern for forming a stepped structure, on or above the upper mirror, and performing first-phase etching for etching the surface layer of the upper mirror to determine the horizontal position of the stepped structure; forming a current confining structure after the performing first-phase etching; and performing second-phase etching for further etching the area that the first-phase etching has been performed, to determine the depth position of the stepped structure, after the forming a current confining structure.
申请公布号 US7863061(B2) 申请公布日期 2011.01.04
申请号 US20090509635 申请日期 2009.07.27
申请人 CANON KABUSHIKI KAISHA 发明人 IKUTA MITSUHIRO;INAO YASUHISA;YAMAGUCHI TAKAKO
分类号 H01L21/00 主分类号 H01L21/00
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