发明名称 |
PRE CLEANING PROCESS EQUIPMENT FOR REMOVAL SLURRY |
摘要 |
PURPOSE: A cleaning apparatus for eliminating slurry is provided to maximize cleaning effect by simultaneously implementing a chemically cleaning process and a physically cleaning process in one cleaning bath. CONSTITUTION: A sliced silicon wafer and a beam on which the slice wafer is arranged are fixed to a basket. The cleaning bath(2) eliminates slurry on the sliced silicon wafer using a spraying technique. A robot(3) moves a basket. The sliced silicon wafer and the beam are separated using chemical at high temperature in the cleaning bath. A rinse cleaning bath is composed of an overflow type.
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申请公布号 |
KR20110000069(A) |
申请公布日期 |
2011.01.03 |
申请号 |
KR20090057422 |
申请日期 |
2009.06.26 |
申请人 |
NEOSEMITECH CORPORATION |
发明人 |
LEE, JUNG SUK;CHOI, YOUNG CHUL;SONG, JOON SUK;OH, MYUNG HWAN |
分类号 |
H01L21/304;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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