发明名称 TRANSPARENT SUBSTRATE FOR MASK BLANK AND MASK BLANK
摘要 In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.
申请公布号 KR101004542(B1) 申请公布日期 2011.01.03
申请号 KR20050084719 申请日期 2005.09.12
申请人 发明人
分类号 H01L21/027;G03F1/32;G03F1/38;G03F1/60 主分类号 H01L21/027
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