| 摘要 |
A surface-distortion measuring device and a surface-distortion measuring method can quantitatively, rapidly, and highly accurately measure and evaluate surface-distortion distribution at all of observable points on a specular or semi-specular surface of a measurement target. The device includes pattern displaying means 2 capable of switching and displaying a plurality of kinds of light-and-shade patterns 5, capturing means 3 for capturing mirror images, reflected in the specular or semi-specular surface of a measurement target 1, of the plurality of light-and-shade patterns displayed on the pattern displaying means, and surface-distortion distribution calculating means 10 for performing image processing on the captured mirror images of the plurality of light-and-shade patterns to calculate surface-distortion distribution of the measurement-target surface. |
