发明名称 STRUCTURE OF POWER GRID FOR SEMICONDUCTOR DEVICES AND METHOD OF MAKING THE SAME
摘要 PURPOSE: A power grid structure for semiconductor devices and a manufacturing method thereof are provided to improve the overall performance and the reliability of a semiconductor device by preventing the electro migration in a joint or intersection area between the conductive stud and the conductive path. CONSTITUTION: A semiconductor device(202) is formed on a semiconductor substrate(201). A conductive stud(212) is formed within a dielectric layer(211). A conductive via(242) is formed to touch with the semiconductor stud. The conductive via comprises a conductive liner(241) covering the floor and the sidewalls.
申请公布号 KR20100138752(A) 申请公布日期 2010.12.31
申请号 KR20100053851 申请日期 2010.06.08
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LI WAI KIN;WANG PING CHUAN;FILIPPI RONALD G.
分类号 H01L23/495;H01L23/525 主分类号 H01L23/495
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