发明名称 |
STRUCTURE OF POWER GRID FOR SEMICONDUCTOR DEVICES AND METHOD OF MAKING THE SAME |
摘要 |
PURPOSE: A power grid structure for semiconductor devices and a manufacturing method thereof are provided to improve the overall performance and the reliability of a semiconductor device by preventing the electro migration in a joint or intersection area between the conductive stud and the conductive path. CONSTITUTION: A semiconductor device(202) is formed on a semiconductor substrate(201). A conductive stud(212) is formed within a dielectric layer(211). A conductive via(242) is formed to touch with the semiconductor stud. The conductive via comprises a conductive liner(241) covering the floor and the sidewalls. |
申请公布号 |
KR20100138752(A) |
申请公布日期 |
2010.12.31 |
申请号 |
KR20100053851 |
申请日期 |
2010.06.08 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LI WAI KIN;WANG PING CHUAN;FILIPPI RONALD G. |
分类号 |
H01L23/495;H01L23/525 |
主分类号 |
H01L23/495 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|