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发明名称
METHOD OF PRODUCING A GLASS SUBSTRATE FOR A MASK BLANK, METHOD OF PRODUCING A MASK BLANK, METHOD OF PRODUCING A TRANSFER MASK, METHOD OF PRODUCING A SEMICONDUCTOR DEVICE, GLASS SUBSTRATE FOR A MASK BLANK, MASK BLANK, AND TRANSFER MASK
摘要
申请公布号
KR101004525(B1)
申请公布日期
2010.12.31
申请号
KR20030056812
申请日期
2003.08.18
申请人
发明人
分类号
H01L21/027;B24B37/04;C09G1/02
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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