Aqueous cerium oxide and silicon dioxide-containing dispersion, obtained by mixing cerium oxide-starting dispersion and silica-starting dispersion under stirring and dispersing at specified shear rate, useful to polish dielectric surface

摘要

Aqueous cerium oxide and silicon dioxide-containing dispersion, obtained by mixing (a) a cerium oxide-starting dispersion and (b) silica-starting dispersion under stirring and subsequently dispersing at a shear rate of 10000-30000 s ->1>, where: (a) comprises, as solid phase, 0.5-30 wt.% of cerium oxide particles with an average particle size distribution of 10-100 nm and a pH value of 1-7; and (b) comprises, as solid phase, 0.1-30 wt.% of colloidal silica particles with an average particle size distribution of 3-50 nm and a pH of 6-11.5. Aqueous cerium oxide and silicon dioxide-containing dispersion, obtained by mixing (a) a cerium oxide-starting dispersion and (b) silica-starting dispersion under stirring and subsequently dispersing at a shear rate of 10000-30000 s ->1>, where: (a) comprises, as solid phase, 0.5-30 wt.% of cerium oxide particles with an average particle size distribution of 10-100 nm and a pH value of 1-7; (b) comprises, as solid phase, 0.1-30 wt.% of colloidal silica particles with an average particle size distribution of 3-50 nm and a pH of 6-11.5; the average particle size distribution of cerium oxide particles is greater than silica particles; the weight ratio of cerium oxide/silica is greater than 1; and the amount of cerium oxide-starting dispersion is measured such that the zeta potential of the dispersion is negative.