发明名称 PHOTOELECTRIC CONVERSION DEVICE, MANUFACTURING METHOD THEREOF AND SEMICONDUCTOR DEVICE
摘要 The present invention provides a photoelectric conversion device in which a leakage current is suppressed. A photoelectric conversion device of the present invention comprises: a first electrode over a substrate; a photoelectric conversion layer including a first conductive layer having one conductivity, a second semiconductor layer, and a third semiconductor layer having a conductivity opposite to the one conductivity of the second semiconductor layer over the first electrode, wherein an end portion of the first electrode is covered with the first semiconductor layer; an insulating film, and a second electrode electrically connected to the third semiconductor film with the insulating film therebetween, over the insulating film, are formed over the third semiconductor film, and wherein a part of the second semiconductor layer and a part of the third semiconductor layer is removed in a region of the photoelectric conversion layer, which is not covered with the insulating film.
申请公布号 US2010330729(A1) 申请公布日期 2010.12.30
申请号 US20100821201 申请日期 2010.06.23
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 SUGAWARA YUUSUKE;NISHI KAZUO;ARAO TATSUYA;YAMADA DAIKI;TAKAHASHI HIDEKAZU;KUSUMOTO NAOTO
分类号 H01L31/18;H01L31/0232 主分类号 H01L31/18
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