发明名称 |
CONNECTING MATERIAL AND SEMICONDUCTOR DEVICE |
摘要 |
The invention provides a connecting material comprising metallic particles with an oxygen state ratio of less than 15% as measured by X-ray photoelectron spectroscopy, and especially a connecting material comprising metallic particles that have been subjected to treatment for removal of the surface oxide film and to surface treatment with a surface protective material, for the purpose of providing a connecting material having a high coefficient of thermal conductivity even when joined at a curing temperature of up to 200°C without application of a load, and that has sufficient bonding strength even when the cured product has been heated at 260°C, as well as a semiconductor device employing it. |
申请公布号 |
KR20100137581(A) |
申请公布日期 |
2010.12.30 |
申请号 |
KR20107026727 |
申请日期 |
2009.04.28 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
HAYASHI HIROKI;KONNO KAORU;TAIRA AYAKO |
分类号 |
C09J11/04;C09J9/00;H01B5/00;H01R4/04 |
主分类号 |
C09J11/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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