发明名称 CONNECTING MATERIAL AND SEMICONDUCTOR DEVICE
摘要 The invention provides a connecting material comprising metallic particles with an oxygen state ratio of less than 15% as measured by X-ray photoelectron spectroscopy, and especially a connecting material comprising metallic particles that have been subjected to treatment for removal of the surface oxide film and to surface treatment with a surface protective material, for the purpose of providing a connecting material having a high coefficient of thermal conductivity even when joined at a curing temperature of up to 200°C without application of a load, and that has sufficient bonding strength even when the cured product has been heated at 260°C, as well as a semiconductor device employing it.
申请公布号 KR20100137581(A) 申请公布日期 2010.12.30
申请号 KR20107026727 申请日期 2009.04.28
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 HAYASHI HIROKI;KONNO KAORU;TAIRA AYAKO
分类号 C09J11/04;C09J9/00;H01B5/00;H01R4/04 主分类号 C09J11/04
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