发明名称 |
METHOD AND APPARATUS FOR INSPECTING PATTERN DEFECTS |
摘要 |
An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect detection unit is performed off-line asynchronously with an image acquisition process that is performed by the image acquisition unit.
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申请公布号 |
US2010328446(A1) |
申请公布日期 |
2010.12.30 |
申请号 |
US20100876699 |
申请日期 |
2010.09.07 |
申请人 |
SAKAI KAORU;MAEDA SHUNJI;OKABE TAKAFUMI |
发明人 |
SAKAI KAORU;MAEDA SHUNJI;OKABE TAKAFUMI |
分类号 |
G01B11/30;H04N7/18;G01N21/95;G01N21/956;G06K9/00;G06T1/00;G06T7/00;H01L21/66 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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