发明名称 RECONFIGURABLE LITHOGRAPHIC STRUCTURES
摘要 A lithographically structured device has an actuation layer and a control layer operatively connected to the actuation layer. The actuation layer includes a stress layer and a neutral layer that is constructed of materials and with a structure such that it stores torsional energy upon being constructed. The control layer is constructed to maintain the actuation layer substantially in a first configuration in a local environmental condition and is responsive to a change in the local environmental condition such that it permits a release of stored torsional energy to cause a change in a structural configuration of the lithographically structured device to a second configuration, the control layer thereby providing a trigger mechanism. The lithographically structured device has a maximum dimension that is less than about 10 mm when it is in the second configuration.
申请公布号 US2010326071(A1) 申请公布日期 2010.12.30
申请号 US20090864942 申请日期 2009.03.06
申请人 THE JOHN HOPKINS UNIVERSITY 发明人 GRACIAS DAVID HUGO;LEONG TIMOTHY GAR-MING
分类号 F03G7/06 主分类号 F03G7/06
代理机构 代理人
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