发明名称 Wafer-Haltevorrichtung
摘要 A wafer holding device, comprising a rotating baseplate (12), a wafer seat (13) which is provided on the rotating baseplate coaxially with the rotating baseplate and which receives a peripheral edge of a wafer (7) by a circumference, a predetermined number of chuck levers (25) rotatably mounted on the wafer seat so that the chuck levers can be rotated around an axis extending in a tangential direction on a circumference of the rotating baseplate, and springs (28) for resiliently pushing an end of the chuck lever toward the wafer seat, wherein the peripheral edge of the wafer received on the wafer seat is pinched by the wafer seat and the chuck lever. <IMAGE>
申请公布号 DE60238291(D1) 申请公布日期 2010.12.30
申请号 DE2002638291 申请日期 2002.04.17
申请人 KABUSHIKI KAISHA TOPCON 发明人 NOGUCHI, IKUO
分类号 H01L21/66;H01L21/68;H01L21/00;H01L21/683;H01L21/687 主分类号 H01L21/66
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