发明名称 Diffraction Based Overlay Metrology Tool and Method
摘要 A method for determining overlay between a first grating (110) and a second grating (120) on a substrate (100), the second grating (120) on top of the first grating (110), the second grating (120) having substantially identical pitch (P1) as the first grating (110), the second and first gratings forming a composite grating (110,120), the method including providing a first illumination beam (IB) for illuminating the composite grating (110,120) under an angle of incidence (β) along a first horizontal direction (D1) along the surface of the substrate, and measuring a first intensity (i+) of a first order diffracted beam (B+) from the composite grating (110,120); providing a second illumination beam for illuminating the composite grating (11θ!i2O) under the angle of incidence (−β) along a second horizontal direction (D2) along the surface of the substrate, wherein the second horizontal direction (D2) is opposite to the first horizontal direction (DI)1 and measuring a second intensity (i−) of a minus first order diffracted beam (B−) from the composite grating (110,120).
申请公布号 US2010328655(A1) 申请公布日期 2010.12.30
申请号 US20090747795 申请日期 2009.12.09
申请人 ASML, NETHERLANDS B.V. 发明人 DEN BOEF ARIE JEFFREY
分类号 G01N21/00 主分类号 G01N21/00
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