发明名称 |
SUBSTRATE PROCESSING SYSTEM, CARRYING DEVICE, AND COATING DEVICE |
摘要 |
A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state.
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申请公布号 |
US2010326354(A1) |
申请公布日期 |
2010.12.30 |
申请号 |
US20100877881 |
申请日期 |
2010.09.08 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SAHODA TSUTOMU;SHIMAI FUTOSHI;SATO AKIHIKO |
分类号 |
H01L21/67;B05B13/02;B05C9/08;B05C9/10;B05C9/12;B05C9/14;B05C11/00;B05C13/00;B25J11/00;B25J15/00;B25J15/06;B25J21/00;H01L21/677;H01L21/687 |
主分类号 |
H01L21/67 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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