发明名称 Laser-Bestrahlungsapparat, Laser-Bestrahlungsverfahren und Herstellungsverfahren für Halbleitervorrichtung
摘要 <p>It is an object of the present invention to provide a laser irradiation apparatus which can form a linear beam spot with a short optical path length, form a linear beam spot being long in a long-side direction, and reduce displacement of a condensing point at opposite ends in a direction of its line. In a laser irradiation apparatus having an optical system for shaping a laser beam emitted from a laser oscillator into a linear beam spot having a long-side direction and a short-side direction, the optical system includes a long-side direction condensing cylindrical lens disposed between a first short-side direction condensing cylindrical lens and a second short-side direction condensing cylindrical lens. Displacement of a position of a homogeneous plane is generated by the long-side direction condensing cylindrical lens so that a distance from the homogeneous plane to the second short-side direction condensing cylindrical lens is constant not depending on a field angle.</p>
申请公布号 DE602005024758(D1) 申请公布日期 2010.12.30
申请号 DE20056024758T 申请日期 2005.12.01
申请人 SEMICONDUCTOR ENERGY LABORATORY CO. LTD. 发明人 TANAKA, KOICHIRO;OHISHI, HIROTADA
分类号 G02B27/09;B23K26/073;G02B27/00;H01L21/20;H01L21/268 主分类号 G02B27/09
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