发明名称 |
Laser-Bestrahlungsapparat, Laser-Bestrahlungsverfahren und Herstellungsverfahren für Halbleitervorrichtung |
摘要 |
<p>It is an object of the present invention to provide a laser irradiation apparatus which can form a linear beam spot with a short optical path length, form a linear beam spot being long in a long-side direction, and reduce displacement of a condensing point at opposite ends in a direction of its line. In a laser irradiation apparatus having an optical system for shaping a laser beam emitted from a laser oscillator into a linear beam spot having a long-side direction and a short-side direction, the optical system includes a long-side direction condensing cylindrical lens disposed between a first short-side direction condensing cylindrical lens and a second short-side direction condensing cylindrical lens. Displacement of a position of a homogeneous plane is generated by the long-side direction condensing cylindrical lens so that a distance from the homogeneous plane to the second short-side direction condensing cylindrical lens is constant not depending on a field angle.</p> |
申请公布号 |
DE602005024758(D1) |
申请公布日期 |
2010.12.30 |
申请号 |
DE20056024758T |
申请日期 |
2005.12.01 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO. LTD. |
发明人 |
TANAKA, KOICHIRO;OHISHI, HIROTADA |
分类号 |
G02B27/09;B23K26/073;G02B27/00;H01L21/20;H01L21/268 |
主分类号 |
G02B27/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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