发明名称 Semiconductor device and method of manufacturing thereof
摘要 A semiconductor device has a semiconductor substrate, and a capacitor which is provided on the upper side of the semiconductor substrate and composed of a lower electrode, an upper electrode and a dielectric film, the dielectric film being placed in between the lower electrode and the upper electrode, the lower electrode including a noble metal film, and a plurality of conductive oxide films formed in an islands arrangement on the noble metal film.
申请公布号 US2010330769(A1) 申请公布日期 2010.12.30
申请号 US20100923117 申请日期 2010.09.02
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAMAKAWA KOJI;YAMAZAKI SOICHI
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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