发明名称 |
ION IMPLANTATION APPARATUS |
摘要 |
A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and the wheel is formed with tensioned spokes supporting a rim carrying the wafer supports. The spokes may be used for carrying cooling fluid to and from the wafer supports. In one embodiment, a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel.
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申请公布号 |
US2010327181(A1) |
申请公布日期 |
2010.12.30 |
申请号 |
US20090494269 |
申请日期 |
2009.06.30 |
申请人 |
TWIN CREEKS TECHNOLOGIES, INC. |
发明人 |
RYDING GEOFFREY;SMICK THEODORE H.;PURSER KENNETH HARRY;GLAVISH HILTON;GILLESPIE JOEPH DANIEL |
分类号 |
H01J37/20;H01J27/00 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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