发明名称 IGZO-BASED OXIDE MATERIAL AND METHOD OF PRODUCING IGZO-BASED OXIDE MATERIAL
摘要 PURPOSE: An IGZO system oxide material, and a producing method thereof are provided to obtain a single-crystal phase IGZO system oxide material by plasticizing at the optimum plasticizing condition. CONSTITUTION: An IGZO system oxide material is marked with a composition expression of In2-xGaxZnO4-delta, and formed with a single-crystal phase including an YbFe2O4 type crystalline structure. In the composition expression, x is bigger than 0.75 and smaller than 1.10. A producing method of the IGZO system oxide material comprises a step of plasticizing mixed materials containing In, Ga, and Zn.
申请公布号 KR20100137376(A) 申请公布日期 2010.12.30
申请号 KR20100057980 申请日期 2010.06.18
申请人 FUJIFILM CORPORATION 发明人 UMEDA KENICHI;SUZUKI MASAYUKI;TANAKA ATSUSHI
分类号 C01G15/00;C04B35/00;H01B1/08 主分类号 C01G15/00
代理机构 代理人
主权项
地址