发明名称 METHOD FOR PRODUCTION OF PURIFIED SILICON
摘要 A standard temperature gradient (T0) and a standard solidification rate (R0) which meet the formula (1) are determined in advance based on C10max and Y0. k=[K1×Ln(R0)+K2]×[K3×exp[K4×R0×(K5×C2+K6)]]×[K7×T0+K8]−K9 (1) wherein k represents a coefficient selected from a range from 0.9 time to 1.1 times an aluminum effective distribution coefficient (k′) so measured as to meet the formula (2): C10max=k′×C2×(1−Y0)k′-1 (2) wherein k′ represents analuminum effective distribution coefficient; C2 represents the concentration of aluminum in a silicon molten solution raw material.
申请公布号 US2010329958(A1) 申请公布日期 2010.12.30
申请号 US20080668133 申请日期 2008.07.11
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 MEGUMI TOMOHIRO;TABUCHI HIROSHI
分类号 C01B33/021 主分类号 C01B33/021
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