发明名称 |
METHOD FOR PRODUCTION OF PURIFIED SILICON |
摘要 |
A standard temperature gradient (T0) and a standard solidification rate (R0) which meet the formula (1) are determined in advance based on C10max and Y0. k=[K1×Ln(R0)+K2]×[K3×exp[K4×R0×(K5×C2+K6)]]×[K7×T0+K8]−K9 (1) wherein k represents a coefficient selected from a range from 0.9 time to 1.1 times an aluminum effective distribution coefficient (k′) so measured as to meet the formula (2): C10max=k′×C2×(1−Y0)k′-1 (2) wherein k′ represents analuminum effective distribution coefficient; C2 represents the concentration of aluminum in a silicon molten solution raw material.
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申请公布号 |
US2010329958(A1) |
申请公布日期 |
2010.12.30 |
申请号 |
US20080668133 |
申请日期 |
2008.07.11 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MEGUMI TOMOHIRO;TABUCHI HIROSHI |
分类号 |
C01B33/021 |
主分类号 |
C01B33/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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