| 摘要 |
A method for patterning a substrate (5), the method comprising: illuminating a predetermined area of the substrate by means of an illumination system (20) that comprises an array of light sources (21) controllable to form time-varying images, an image projection system (22), and a microlens array (7) comprising individual microlenses (8) which are arranged to provide an optical light path for the light sources, the image projection system being arranged for projecting the images onto the microlens array such that individual ones of the microlenses (8) each project radiation (18) incident thereon in the form of separate corresponding concentrated microspots (17) onto said predetermined area; wherein the array of light sources (21) is statically arranged along an arc segment having a radius and the microlenses (8) are circumferentially arranged on the microlens array on a perimeter corresponding to the arc segment, and wherein the microlens array (7) is controlled to perform a rotating movement (9) which is parallel to a straight plane, relative to at least part of the image projection system (22) and relative to the substrate (5), while synchronously the array of light sources (21) is controlled to form the time-varying images, in such way that during said rotating movement (9) of the microlens array (7) the microspots (17) describe an arc pattern on the predetermined area of the substrate (5).
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