发明名称 NONVOLATILE RESISTANCE CHANGE RAM
摘要 <p>Disclosed is a nonvolatile resistance change RAM. The nonvolatile resistance change RAM comprises: a first electrode; and a second electrode. An oxide layer is positioned between the first electrode and the second electrode. A reactive metal layer is positioned between the oxide layer and the second electrode and contains a metal in which a variance of standard free energy is -100kJ or less in the oxide reaction on the basis of 300K.</p>
申请公布号 WO2010150957(A1) 申请公布日期 2010.12.29
申请号 WO2010KR00128 申请日期 2010.01.08
申请人 GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY;HWANG, HYUN-SANG;SEONG, DONG-JUN 发明人 HWANG, HYUN-SANG;SEONG, DONG-JUN
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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