<p>Disclosed is a nonvolatile resistance change RAM. The nonvolatile resistance change RAM comprises: a first electrode; and a second electrode. An oxide layer is positioned between the first electrode and the second electrode. A reactive metal layer is positioned between the oxide layer and the second electrode and contains a metal in which a variance of standard free energy is -100kJ or less in the oxide reaction on the basis of 300K.</p>
申请公布号
WO2010150957(A1)
申请公布日期
2010.12.29
申请号
WO2010KR00128
申请日期
2010.01.08
申请人
GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY;HWANG, HYUN-SANG;SEONG, DONG-JUN