METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBER HAVING A ROTATING MAGNETRON

摘要

The aim of the invention, which relates to a method for coating a substrate in a vacuum chamber having a rotating magnetron, wherein a substrate is guided past the magnetron in a substrate transport direction and is coated by means of a material, which has been isolated from a target connected to the magnetron, optionally with the material reacting with a reactive gas present in the vacuum chamber, is to improve the homogeneity of the layer on a substrate by stabilizing the working point by way of the target rotation. This is achieved in that a periodic change of a first process parameter caused by the target revolution is compensated for by a periodic change of a second process parameter having a determined level and/or that two magnetrons having different rotational speeds are provided.