| 摘要 |
<p>PURPOSE: A gas supply device, a substrate processing device, and a substrate processing method are provided to uniformize, optimize, and correct a process property in the outermost part of a substrate. CONSTITUTION: A gas process supply unit(66) supplies process gas for processing a substrate to a gas introduction member. A process gas supplying path(64) spills the process gas from the processing gas supply unit. A plurality of branch paths are branched from the process gas supply path. An additional gas supply path(76) is connected to an additional gas supply unit and a gas introduction member.</p> |
