A lithographic projection apparatus is disclosed in which a liquid supply system provides an immersion liquid between a final element of the projection system and the substrate. An active drying station (ADS) is provided for actively removing immersion liquid from the substrate (W) or other objects after immersion of the substrate.
申请公布号
EP2267538(A1)
申请公布日期
2010.12.29
申请号
EP20100180507
申请日期
2005.05.11
申请人
ASML NETHERLANDS BV
发明人
STREEFKERK, BOB;DONDERS, SJOERD;LOOPSTRA, ERIK;MULKENS, JOHANNES