发明名称 |
ALKALI-SOLUBLE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE BOTH INCLUDING SAME |
摘要 |
<p>Disclosed is an alkali-soluble resin including a polybenzoxazole precursor structure constituted of both a bis(aminophenol) and a structure derived from a dicarboxylic acid, wherein when the two aromatic rings of the bis(aminophenol) are rotated, the rotational energy barrier for the dihedral angle, as obtained by a calculation based on computational chemistry, is 3 kcal/mol or more.</p> |
申请公布号 |
WO2010150518(A1) |
申请公布日期 |
2010.12.29 |
申请号 |
WO2010JP04136 |
申请日期 |
2010.06.22 |
申请人 |
SUMITOMO BAKELITE CO., LTD.;TERAYAMA, MIKI |
发明人 |
TERAYAMA, MIKI |
分类号 |
C08G73/22;G03F7/023;H01B3/30 |
主分类号 |
C08G73/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|