发明名称 ALKALI-SOLUBLE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE BOTH INCLUDING SAME
摘要 <p>Disclosed is an alkali-soluble resin including a polybenzoxazole precursor structure constituted of both a bis(aminophenol) and a structure derived from a dicarboxylic acid, wherein when the two aromatic rings of the bis(aminophenol) are rotated, the rotational energy barrier for the dihedral angle, as obtained by a calculation based on computational chemistry, is 3 kcal/mol or more.</p>
申请公布号 WO2010150518(A1) 申请公布日期 2010.12.29
申请号 WO2010JP04136 申请日期 2010.06.22
申请人 SUMITOMO BAKELITE CO., LTD.;TERAYAMA, MIKI 发明人 TERAYAMA, MIKI
分类号 C08G73/22;G03F7/023;H01B3/30 主分类号 C08G73/22
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