发明名称 |
Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound |
摘要 |
A fluorine-containing polymeric compound obtained by polymerizing only polymerizable monomers represented by general formula (c1-0) shown below: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an aliphatic hydrocarbon group substituted with fluorine atoms, or a group in which a plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms are bonded through a linking group containing a hetero atom, with the proviso that at least one of the plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms is an aliphatic hydrocarbon group substituted with fluorine atoms.
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申请公布号 |
US7858288(B2) |
申请公布日期 |
2010.12.28 |
申请号 |
US20080108762 |
申请日期 |
2008.04.24 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
IRIE MAKIKO |
分类号 |
G03F7/039;C08F18/20;G03F7/20 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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