HIGH RESISTANCE CERMET RESISTOR AND METHOD OF FORMING THE SAME

摘要

PURPOSE: A high resistance cermet resistor and a forming method thereof are provided to prevent hypoxia by selectively performing anodizing process after a deposition process. CONSTITUTION: A first photoresist pattern is formed on a substrate(10). A metal electrode(30) is deposited on the front of a substrate. A first photo resistor pattern is removed from the substrate. A second photo resist pattern is formed on the substrate without a resistor formation position. A mixture is deposited on the front of the substrate and is made of active material and stable metal. A cermet resistor(60) is formed by anodizing the mixture. A second photoresist pattern is removed from the substrate.